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(Oct. 12) Atomic Layer Deposition for Emerging Display Applications: From Oxide Semiconductor Transistors to Flexible devices

Last updated :2018-10-09

Topic: Atomic Layer Deposition for Emerging Display Applications: From Oxide Semiconductor Transistors to Flexible devices
Speaker: Professor Jin-Seong Park
(Hanyang University, South Korea)
Host: Professor XI Bin
Time: 2:30-3:30 pm, Friday, October 12, 2018
Venue: B403, School of Engineering, Guangzhou East Campus, SYSU

Abstract:
In this seminar, Prof. Park will take the brief emerging display market trend and forecast to understand what they are looking for. In fact, the AMOLED (active matrix organic light emitting diode) Television markets are just starting at early 2013. There are a few possibilities and needs to be developing for AMOLED, flexible and transparent Display markets. Then, firstly, the functional oxide conductor/semiconductor films deposited by ALD will be discussed for applying transparent conductor and thin film transistor as an active layer even on flexible substrates, including InOx, SnOx, ZnSnO, InZnOx, InGaZnOx, and InZnSnOx. Secondly, functional oxide and organic thin films, deposited by ALD/MLD have been demonstrated in emerging applications (flexible, transparent, and wearable things). In particular, gas diffusion barrier properties such as water and oxygen water vapor are important for passivation and encapsulation applications. There are still many chances to study and investigate various functional thin films to apply for the NEXT display applications.